PMR-2200C Ion Implant Dose Monitor
PMR-C system is ideal for implant monitoring of SiC product wafers, as it has excellent sensitivity to a wide range of implantation parameters (ion mass, ion dose, implantation temperature, etc.) with pattern recognition capability.
Semilab PMR-2200C is designed primarily for ion implanted SiC wafer monitoring and gives accurate feedback on self-healing process of SiC crystal, and it provides effective non-destructive inline monitoring of monitoring Si wafers as well.
Key Features:
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Implant parameters monitoring on SiC product wafers and Si monitor wafers
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Measurement capability of wide dose ranges (E11 ions/cm2 - E16 ions/cm2)
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Sensitivity for even low doses in all implant species with improved throughput & stability
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Implant species: Al, N, P, As
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Handling of 4-8” samples (SiC, Si)
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SMIF or open cassette loading
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Pattern recognition (optional)
Applications:
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Ion implantation dose monitoring (pre-anneal)
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Ion implant tilt angle monitoring (pre-anneal)
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Dose rate monitoring (pre-anneal)
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Implant temperature monitoring (pre-anneal)
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Anneal quality monitoring (post-anneal)