Excimer Laser Annealing (ELA) is the key process parameter in Low Temperate Silicon (LTPS) layer manufacturing: ELA determines many important final parameters of the layer and finally of the device: crystallinity, mobility, etc. Semilab developed a combination of metrologies which can easily determines the Optimal Energy Density (OED). This combination is capable to distinguish the properties of two LTPS samples which were annealed with very similar annealing parameters. Using this feature fine tuning of ELA process is easy and fast and does not require any macro inspection with human decision.
Furthermore using our contact 6pp the sheet resistance can be determined as well.