We are pleased to release the Semilab LumIR-2300, a non-destructive metrology system with full wafer imaging that has the capability of measuring defects in InP, GaAs and InGaAs compound semiconductor materials.

The new LumIR-2300 combines a non-destructive measurement method and a modern platform that fulfills industry standards and provides automatic full wafer imaging mode with defect searching, classification, and reporting, moreover chip level reporting as an optional feature. With all that, the Semilab LumIR metrology system is ready to level up incoming wafer inspection, quality control and process monitoring for wafer and IC manufacturing.

The LumIR system performs compound semiconductor imaging technology with dual load port and multiple wavelength excitation. The system provides defect inspection by utilizing pattern recognition and extreme sensitivity for SWIR detection ranging from 830 nm to 1700 nm. It is also suitable for recording, storing, and displaying several kinds of measurement data—depending on the measurement modes—of standard 75 mm, 100mm and 150 mm wafers and slugs.

The LumIR-2300 is a compact solution with fast scanning speed, high signal-to-noise ratio and OHT, AGV capacity for fast and precise automated measurement on full wafers.

For further information contact us at your local Semilab office.