inSE-1000 In-Situ Spectroscopic Ellipsometer

The new in-situ thickness measurement system, inSE-1000 provides instant access to layer thicknesses and optical properties through ellipsometric specra analysis during layer deposition processes in vacuum chambers and load locks.

inSE-1000 is the part of Semilab's ellipsometry tool family specially designed for the measurement on vacuum chambers during deposition or treatment processes or in load locks. The easily mountable arms can be placed on the vacuum chamber or on an offline testbench for detailed investigation of the final product. The electronic components and supplementary systems are situated in a cabinet, which can be placed next to the deposition tool. The ethernet interface allows on-demand measurement sequence with the deposition tool and the two-way communication protocol.

Features and system specifications:

• CF-40 vacuum port interface
• 75 W, short arc Xenon lamp by optical fiber
• Rotating compensator optics
• Beam divergence < 0.2^o ( in parallel beam, no focusing)
• Compact arms
• Spectral resolution for fast mode

Software:

• Immediate visualization of the measurement data and the fitting results: thickness and optical properties
• Modelling of each layer with all known methods including dispersion laws, alloy model, periodic layers, phase node model, anisotropic layer evaluation, or user-defined free formula
• Ethernet-based communication protocol with the deposition tool computer
• The largest (n, k) database