EIR-2500

The EIR-2500 is a unique automated epi thickness measurement tool with infared spectroscopic reflectometer for high throughput epi thickness measurement. Fully compliant to the relevant SEMI / CE standards. The EIR product line is based on smart, reliable electronics, which improves tool uptime and decreases maintenance needs.

Features and System specifications:

• Wafer size: up to 300 mm
• Loadport: Single or dual casette loadport
• Fast mapping stage
• Capable of handling the IR reflectance measurement head (for epi thickness)
• Capable of handling additional measurement heads (for example Spectroscopic Ellipsometer, 4PP)
• Measurement modes:
  • Interferogram mode:
    • Measures interferograms, which are analyzed using direct inversion method.
    • For fast measurements of thick epi layers and simple film stacks.
  • Reflectance mode:
    • Measures reflectance. Interference fringes are observed in the reflectance spectra, which are analyzed using optical modeling of the filmstack.
    • For thin (< 2 μm) epi, or for complex stacks with multi-layers or gradient profiles.

Software Highlights:

• Semilab Automation Manager (SAM) to fully control the measurement cycle
• Recipe-based operation, based on SEMI recommendations
• Compliant with SECS/GEM, SECSII/GEM and CIM host communication standards (CMS, E87, STS and so on)
• Smart evaluation of measurement interferograms:
  • Interferogram substraction as standard analysis method
  • Complex optical model for better precision in case of thin layers by reflection spectrum modeling
  • Cepstrum method