ACV-2200, ACV-3000, ACV-3100 Non-contact Resistivity Profiling Systems

The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to Schottky-CV or Hg-probe, and thus the output is a traditional CV doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.

The model includes complete automation, powerful software and excellent measurement repeatability.

Features and System specifications:

  • Number of measurement points, measurement area: No limit in measurement points
  • Profile measurement depth: Like MOS CV, depth depends on resistivity and surface charge
  • Measurement of all Epi substrate types: p/p+, n/n+, p/p-, n/n+/p+, bare n or p surface. Other structures like p/n or n/p are possible based on pre-sales demo.
  ACV-2200 ACV-3000 ACV-3100
Wafer Size 100 to 200 mm 300 mm 200 and 300 mm
End Effector Paddle Edge Grip Paddle
Loadport Open Casette / SMIF FOUP FOUP / SMIF /
Open casette
Number of Loadports 1 1 or 2 1 or 2
Factory Automation SECS/GEM Full Full


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