Knowing photoresist thickness is very important at several steps in display manufacturing. Challenge could be the thick and UV sensitive layer as well as the measurement in very small (1-2 um) channel. Semilab can offer solution for both problems using metrology heads designed directly for this application.





Spectroscopic Reflectometry is a widely-used tool for thin film characterization. The measurement provides information on film layer thickness and optical properties. Spot size can be as small as 5 µm which allows us to measure inside the sub-pixel, consequently no separate test pad is needed for the measurement.

In Semilab SR metrology, wide range of wavelength and high intensity Xe-lamp is used, which makes possible to select the measurement wavelength range according to specific process requirements of the Customer. For thicker layers near-infrared extension can be added which allows to us measure up to several tens of micrometers. An UV-filter can also be added to protect the photoresist or other sensitive layers from UV-light. Due to the large light intensity, acquisition time can be reduced to several milliseconds. Fast focusing and precise movement can be performed due to the integrated laser optical displacement sensor and the 2D camera.

Spectroscopic Reflectometry and Ellipsometry both use the same analysis engine. Consequently, the same optical model can be used for the same material even if being measured by two different metrologies.

Organic layer thickness map


Measured and fitted reflectance curve on an organic layer



  • Selectable spot size
  • Fast acquisition time
  • Easy and straightforward way of optical modeling
  • Same optical model can be applied for ellipsometry, reflectometry and Imaging Spectroscopic Reflectometry
  • Large wavelength resolution


Product Line


FPT- series are dedicated for flat panel testing and characterization. The products are designed to characterize LCD and AMOLED TFT panels up to GEN 8.5.  It is capable to combine several measurement probes into one platform, providing high precision measurements over the entire surface of flat panels with high accuracy and fast motorization stage and weight capacity.



FPT can be equipped with:

Optical thickness and refractive index of multilayered oxide and semiconductor structures can be determined by spectroscopic ellipsometery at different process steps. The quality of the ELA process can also be monitored by measuring crystallinity, u-PCR and line mura density. Contact angle, stress and resistivity measurements are also available.

The hardware and software are fully controlled by SEMILAB from the design to the integrated software communication with the fab.   

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SE-2000 Spectroscopic Ellipsometer

SE-2000 features the widest spectral range available on a single tool. The ranging is from the deep UV (190 nm) up to mid-IR (25 μm). The tool is uniquely offered with an optional FTIR ellipsometer head on the same goniometer with the visible arms. It can be configured with the fast detection mode by using spectrograph and detector array, with the high resolution mode by using spectrometer and single point detectors, or with both modes together on the same tool. SE-2000 includes Semilab’s new smart electronics with interchangeable components, and operates with the new generation operating and analysis software (SAM / SEA). The system can be controlled from a PC or laptop through LAN network, or by a new touch panel interface.

Measurement modes:

  • Spectroscopic Ellipsometry for thin film thickness and optical functions, including complex multilayer structures
  • Generalized Ellipsometry for anisotropic materials
  • Transmission Ellipsometry for transparent substrates
  • Scatterometry vs. wavelength and angle of incidence
  • Mueller Matrix (11 or 16 elements) uniquely offered in combination with Scatterometry for 3D anisotropic materials
  • Jones Matrix for simple anisotropic materials
  • Reflectance & Transmittance vs. wavelength and incidence angle
  • Polarimetry
  • Porosimetry: Measurements of pore size and porosity in thin films
  • In situ measurement mode for real time control during deposition or etch process


  • Mapping stage (X, Y, Z, rotation), manual or automatic
  • Microspot (standard and ultra small - customization is subject to discussion)
  • Environmental cells: cryostat, liquid cell, cooling and heating sample stage cells, QCM cell
  • Atmospheric porosimetry chamber
  • Visualization camera
  • Spectroscopic Reflectometer
  • Extended spectral range detection
  • Possibility of integration of other Semilab metrologies (4pp, Eddy, etc.)


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