Spectroscopic Reflectometry is a widely-used tool for thin film characterization. The measurement provides information on film layer thickness and optical properties. Spot size can be as small as 5 µm which allows us to measure inside the sub-pixel, consequently no separate test pad is needed for the measurement.

In Semilab SR metrology, wide range of wavelength and high intensity Xe-lamp is used, which makes possible to select the measurement wavelength range according to specific process requirements of the Customer. For thicker layers near-infrared extension can be added which allows to us measure up to several tens of micrometers. An UV-filter can also be added to protect the photoresist or other sensitive layers from UV-light. Due to the large light intensity, acquisition time can be reduced to several milliseconds. Fast focusing and precise movement can be performed due to the integrated laser optical displacement sensor and the 2D camera.

Spectroscopic Reflectometry and Ellipsometry both use the same analysis engine. Consequently, the same optical model can be used for the same material even if being measured by two different metrologies.