Thin films can be characterized from different aspects. The below listed applications can provide simple and clear information about the wide range of thin film classification.
Spectroscopic Reflectometry is a widely-used tool for thin film characterization. The measurement provides information on film layer thickness and optical properties. Spot size can be as small as 5 µm which allows us to measure inside the sub-pixel, consequently no separate test pad is needed for the measurement.
In Semilab SR metrology, wide range of wavelength and high intensity Xe-lamp is used, which makes possible to select the measurement wavelength range according to specific process requirements of the Customer. For thicker layers near-infrared extension can be added which allows to us measure up to several tens of micrometers. An UV-filter can also be added to protect the photoresist or other sensitive layers from UV-light. Due to the large light intensity, acquisition time can be reduced to several milliseconds. Fast focusing and precise movement can be performed due to the integrated laser optical displacement sensor and the 2D camera.
Spectroscopic Reflectometry and Ellipsometry both use the same analysis engine. Consequently, the same optical model can be used for the same material even if being measured by two different metrologies.
Organic layer thickness map
Measured and fitted reflectance curve on an organic layer
FPT- series are dedicated for flat panel testing and characterization. The products are designed to characterize LCD and AMOLED TFT panels up to GEN 8.5. It is capable to combine several measurement probes into one platform, providing high precision measurements over the entire surface of flat panels with high accuracy and fast motorization stage and weight capacity.