Our latest MCV system, MCV-3000S features a more stable mercury contact on wafers resulting in accurate measurements due to the new measurement chamber design.
Semilab MCV-3000S system while fulfilling industrial standards with an improved performance compared to predecessor systems, is based on an exceptionally reliable contact method for the characterization of dopant concentration and resistivity profile of semiconductors and performs a novel measurement arrangement allowing measurements to be more accurate, less dependent on sample properties and it requires easier overall maintenance.
The Face-down C-V metrology system is invaluable for Si wafermakers who require a highly repeatable way of epitaxial layer characterization on a wide variety of materials up to 12” sample sizes.
MCV-3000S system as a non-destructive measurement method uses upgraded measurement technique:
The system fulfills industrial standards with its modern platform:
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