Semilab, a leading supplier in metrology solutions for semiconductor manufacturing, today launched its EIR. The EIR addresses the FTIR market including EPI thickness and dopant monitoring, dielectric composition and Cs & Oi in wafer bulk. By combining Model Based Analysis and Absolute Reflectance Correction, EIR brings superior accuracy and reliability, and limits the amount of calibration needed during setting up the system. We are excited to bring a new tool with new capabilities to the market, which we believe will help our customers to simplify their calibration routine and improve overall long-term stability and reliability of those monitorings.
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About Semilab
We design, produce and sell metrology equipment for the characterization of semiconductor and photovoltaic materials, for monitoring the manufacturing process of semiconductor devices and solar cells, and also for R&D purposes in these areas. We offer a variety of measurement techniques; most of them are non-contact and non-destructive. Many of our technologies can be flexibly integrated into different platforms, ranging from simple handheld devices and table-top systems with high resolution mapping capability to fully automated stand-alone production control tools for mid-range and high-level fablines. We also offer in-line measurements for solar cell production lines.
Our strategy is to continuously improve our products, and to offer flexible solutions for our customers’ needs with high-value products for a reasonable price.