AFM-2100 Atomic Force Microscope

Semilab Atomic Force Microscopes provide high-resolution, sub-atomic precise measurements with extremely low noise level which enables consistent and highly reproducible roughness characterization for the quality control of Si and compound wafers. AFM-2100 offers state-of-the-art metrology solutions for those seeking atomic force microscopy with manual sample loading, providing flexibility and hands-on control.

The Semilab AFM-2100 system is designed for various applications, including:

1. CMP Process Control:
   • Analysis of micro-roughness and lateral surface structures
2. Automated Defect Review:
   • Defect detection by light-scattering method (μPIT) and characterization using AFM
3. Device Characterization:
   • Critical Dimension measurements, failure analysis

Key Features:

• AFM Tip Scanner, utilizing flexure-guided piezo positioners for flat scanner movement
• Fully automated AFM with manual sample loading
• Automatic tip exchange and laser alignment
• Sub-atomic resolution
• Maximum scan area size can be configured according to industry requirements
• Full 12-inch wafer is accessible by the AFM scanner
• KLARF file import & export
• Profilometer mode
• Optional Advanced Defect Review, Heated stage and Visualization Camera