Application
LABORATORY APPLICATIONS
Troubleshooting manufacturing process needs more comprehensive analysis of the wafers in different process steps. Often these tests are out of scope of in-line and offline process control tools. For this purpose Semilab can offer state-of-the art laboratory tools with multiple capabilities.
These advanced metrology tools can be effectively used in the research and development field to introduce new methods and techniques for high efficiency solar cell production.
Semilab is open for cooperation with customers to improve the tool performance and introduce new applications to cover future metrology needs.
The measurement tools were designed to achieve good tool performance, user-friendly operation and low cost of ownership.
The applications include the following:
- Wafer contamination characterization
- Analytical contamination detection in wafers
- Measurement of electrical parameters in different manufacturing stages
- Optical characterization of deposited layer parameters
- Electrical characterization of deposited dielectric layer parameters
- Measuring surface passivation efficiency and homogeneity
- Testing accelerated light-induced degradation (LID) and potential-induced degradation (PID) of solar cells
Technology
SPECTROSCOPIC ELLIPSOMETRY
In the semiconductor industry, there is continuous demand for higher performance and denser integrated circuits. These requirements push the advancement of technology which requires solving of manufacturing challenges. A key to success is to understand the chemical, mechanical and physical properties of wide range of materials used in a typical integrated circuit.
The µSE tool is designed to measure thin film thickness and optical properties inside a <50µm test pad on semiconductor product wafers. The applied measurement technique for obtaining these parameters in a high accuracy and repeatable way is spectroscopic ellipsometry. The μSE tool uses optimized spectroscopic ellipsometer (SE) arms and optics for the measurement inside small boxes of patterned Si wafers.
Ellipsometry measures the phase of the reflected light from the sample, therefore it is relatively insensitive for intensity fluctuations. The raw measurement data represent the complex information from the layer stack which then need to be modeled optically. The measurement results are obtained through numerical regression process of the model data to the raw measurement spectrum.
TYPICAL SE REGRESSIONS:
FEATURES
- Non-destructive optical technique, based on measurement of the change of the polarisation state of light after reflection at non normal incidence on the surface to study.
- It is a higly sensitive even for layer thickness below 5 nm
- Extremely versatile technique: it gives acccess to numerous parameters which characterize multilayer structures (eg. layer thickness, refractive index, absorption, porosity).
Product Line
SE
Refractive optical design in compact realization: short optical path inside the measurement arms (reduced alignment artifact errors). Active temperature control: stabilized environment for system reli-ability enhancement. Uniqe patented high brightness light source for outstanding SNR. CCD detector array (spectrum is taken simultaneously at different wavelengths).
Products
SE-2100
Printed Electronics. Optical & Electrical Metrology. Thin Film Coating characterization. Layer Thickness control.
Features and System specification:
- Capable for Fast and accurate measurement on square samples up to 350x450 mm or wafers up to 300 mm
- Special design of the chuck to hold Flexible Sample
- Active Vibration damping
- High-resolution mapping stage
- Fast Omron autofocus
- Vertical camera for samples visualisation & Pattern recognition
- Joystick to move the sample easily
- CE and SEMI standards compliant
Components & Options:
- Spectroscopic Ellipsometer:
- Fast acquisition directly on the foil
- Measurement Spot adapted for Plastic substrate
- Spectroscopic Reflectometer:
- For reflection and transmission of the films
- Non-contact Sheet resistance:
- Fast and accurate Sheet resistance by Eddy Current
- For Transparent electrode and Metal
- Other measurement technique like Raman, Lifetime...etc
Applications:
- Display: TFT, OLED on Glass or Flexible substrate
- Lighting: New OLED Lighting application. White OLED
- Printed Electronics: Any process on flexible substrate (transistor, sensors, etc.)
- Photovoltaics: Small Thin Films PV panels, TCO panels