LE-5100

Combined Laser ellipsometer and spectroscopic reflectometer with an X-Y high precision stage. It measures thickness and optical properties (n and k) of mono and multilayer. The measurement is non-destructive and non-contact.

Features and System specifications:

• Wafer size: On the chuck can be put several size and shape of wafers of 150/200/300/450 mm
• Auto focus module with Omron distance sensor
• Light source: Xenon lamp
• Fast spectrograph ensured with high resolution CCD detector
• Sample Stage with X-Y movement for:
  • Mapping
  • Multi-point measurements
  • Single point measurements
• Automated Z movement for excellent focusing
• Pressure control unit for regulated high pressure and vacuum supplies
• Recipe-based operation, based on SEMI recommendations