SPL-2200 & SPL-3000

The reliable SPL-2200 and SPL-3000 systems are designed for diverse inline process monitoring needs with versatile measurement solutions, advanced analysis capabilities enabling real-time quality control of compound (SiC, GaN, LED, etc.) samples up to 300mm.
These metrology systems provide non-contact, non-destructive, combining spectral photoluminescence (PL), spectroscopic reflectometry (SR), and bow/warp measurement to support compound semiconductor industry’s quality control.

Features and System specifications:

• Wafer size: 150/200 – 300 mm
• Two Load Ports (open casette / SMIF / FOUP)
• Combination of different metrologies (SPL, SR, Bow/warp) in a single tool

Customizable metrology options:

• Selectable spatial resolution for fast wafer mapping,
• Laser selection based on requirement up to 5 lasers,
• Motorized entrance slit and UV-VIS-NIR spectral range for the spectrographs,
• High performance grating & detectors,
• Fast automatic focus with advanced capacitive displacement sensor,
• Pattern recognition option

Fulfilling factory automation requirements to assure reliable operation:

• Automated measurement and analysis:
  • Statistical data analysis,
  • Histogram plots and line scans by automated measurements and advanced recipe creation,
  • On-screen maps of calculated parameters,
• SAM2 user interface compliant to SEMI® standard (E95-0200),
• SECS/GEM communication
• MS Windows operating system for multi-tasking
• Option for offline analysis tool