Troubleshooting manufacturing process needs more comprehensive analysis of the wafers in different process steps. Often these tests are out of scope of in-line and offline process control tools. For this purpose Semilab can offer state-of-the art laboratory tools with multiple capabilities.
These advanced metrology tools can be effectively used in the research and development field to introduce new methods and techniques for high efficiency solar cell production.
Semilab is open for cooperation with customers to improve the tool performance and introduce new applications to cover future metrology needs.
The measurement tools were designed to achieve good tool performance, user-friendly operation and low cost of ownership.
The applications include the following:
Semilab SDI FAaST systems represent state-of-the-art non-contact electrical metrology used in manufacturing control and development of semiconductor devices and materials. Employing non-contact surface potential probing techniques combined with illumination and/or non-invasive surface charging, these powerful techniques measure a broad range of parameters characterizing semiconductor wafers, dielectrics and interfaces with astounding precision, while saving the cost and time involved in fabricating dedicated test devices.
The major application of the Non-Contact C-V profiling metrology is monitoring of dielectrics during IC manufacturing. The most important feature, differentiating it from conventional electrical measurements, is its preparation free non-contact nature, which eliminates preparation of MOS capacitors, thereby reducing metrology cost and facilitating fast data feedback in both Manufacturing and R&D environments.
The non-contact corona-Kelvin metrology uses corona discharge in air to place an electric charge on a semiconductor wafer. The wafer response is monitored with a vibrating capacitor probe, typically a Kelvin-probe, which measures the surface voltage (Vcpd). Surface voltage monitoring in both the dark and under strong illumination enables separation of two important voltage components:
Analysis of the acquired charge-voltage data provides electrical parameters such as Dit, Vfb, Qtot (dielectric charge), CD, EOT, and Dielectric Leakage.
Example Vcpd vs Qcorona data for dielectric on p-type Si
Example Dit spectra for various dielectrics on Si
The major application of this metrology is monitoring of dielectrics during IC manufacturing. The most important feature, differentiating it from conventional electrical measurements, is its preparation free non-contact nature, which eliminates preparation of MOS capacitors, thereby reducing metrology cost and facilitating fast data feedback in both Manufacturing and R&D environments.
FAaST metrology includes best in the world Semilab SDI unique capabilities:
Semilab SDI FAaST system’s offer:
The WT product line is a powerful measurement platform for performing many different semiconductor material characterization measurements. The base system includes all the overhead functions necessary to perform characterization measurements, including power supplies, computer and operating software, XY measurement stage, etc. The WT-2000 is typically used to make maps, where the wafer is scanned at a programmable raster. Each system is configured to the user’s requirements by adding treatment and measurement capabilities.
Features and System specifications:
It is a new integrated platform with the following capabilities:
Other testing capabilities: