The ACV systems provide 100% non-contact, non-destructive measurements for epi layer resistivity by patented technology. The physics behind the measurement is quite similar to Schottky-CV or Hg-probe, and thus the output is a traditional CV doping profile. The difference is that the electrode does not touch the wafer, resulting in substantial cost savings of monitor wafers.
The model includes complete automation, powerful software and excellent measurement repeatability.
Features and System specifications:
|Wafer Size||100 to 200 mm||300 mm||200 and 300 mm|
|End Effector||Paddle||Edge Grip||Paddle|
|Loadport||Open Casette / SMIF||FOUP||FOUP / SMIF /
|Number of Loadports||1||1 or 2||1 or 2|