The LEI-1510EC is ideal for both R&D and volume production metrology.
The 1510 as a stand-alone unit is manually loaded and automatically maps. It can accommodate 50-200 mm wafers.
Three ranges of measurement accommodate 0.035 to 3200 Ohm/sq as needed by the application. The EC model is slightly faster than the EB model for those applications where throughput is critical.Request Info